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Interfacial interaction and steric repulsion in polymer-assisted liquid exfoliation to produce high-quality graphene

Xiaobing Han, Jie Gao, Tao Chen, and Yuan Zhao

Non-power Nuclear Technology Collaborative Innovation Center, School of Nuclear Technology and Chemistry and Biology, Hubei University of Science and Technology, Xianning, China



Received: 28 March 2019  Accepted: 5 September 2019


Fabrication of high-quality graphene is a key factor to the construction of high-performance graphene-based nanocomposites. For the promising application in scale production, much attention has been focused on the method of liquid exfoliation. Compared with the exfoliation in pure organic solvent and small molecular surfactant-assisted exfoliation, high concentration and stable graphene dispersion can be produced with polymer-assisted exfoliation in low boiling point solvent. This article summarized recent progress in polymer-assisted liquid exfoliation to produce high-quality graphene, especially for the exfoliation mechanism based on interfacial interaction (CH–π, π–π stacking and cation–π), and the stabilization mechanism based on steric repulsion. Finally, an outlook of the future about polymer-assisted liquid exfoliation for the fabrication of high-quality graphene was also provided.

Graphic Abstract:

Interfacial interaction and steric repulsion between polymer and graphene in polymer-assisted liquid exfoliation.

Keywords: Graphene; Liquid exfoliation; Polymer; Interfacial interaction; Steric repulsion

Full paper is available at

DOI: 10.1007/s11696-019-00928-1


Chemical Papers 74 (3) 757–765 (2020)

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